Tien, Ming-Chun

Ultra-low-loss high-aspect-ratio Si_3N_4 waveguides

Bauters, J. F., Heck, M. J. R., John, D., Dai, D., Tien, M.-C., Barton, J. S., Leinse, A., Heideman, R. G., Blumenthal, D. J., & Bowers, J. E. (2011) · Optics Express

Photonic and Optical DevicesPhotorefractive and Nonlinear Optics

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Computational lithography solutions to support EUV high-NA patterning

Zhao, R., Zhou, F., Tang, J., Lu, J., Liu, Y., Sun, D., Tien, M.-C., Hsu, S., Gupta, R., Zhang, Y., et al. (2023) · DTCO and Computational Patterning II

Advancements in Photolithography TechniquesAdvanced optical system design

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