Soulié, Jean-Philippe

Study of novel EUVL mask absorber candidates

Wu, M., Thakare, D., de Marneffe, J.-F., Jaenen, P., Souriau, L., Opsomer, K., Soulié, J.-P., Erdmann, A., Mesilhy, H. M. S., Naujok, P., et al. (2021) · Journal of Micro/Nanopatterning, Materials, and Metrology

Advancements in Photolithography TechniquesAdvanced X-ray Imaging Techniques

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