Delabie, Annelies

IMEC · KU Leuven

1 paper on CoChatORCID 0000-0001-9739-7419

Most cited papers

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Optimizing extreme ultraviolet lithography imaging metrics as a function of absorber thickness and illumination source: a simulation case study of Ta-Co alloy
Thakare, D., Delabie, A., & Philipsen, V. (2023) · Journal of Micro/Nanopatterning, Materials, and Metrology
Advancements in Photolithography TechniquesAdvanced X-ray Imaging Techniques
Cited by 8

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