Lodha, Jayant K.

IMEC · KU Leuven

1 paper on CoChatORCID 0000-0001-8486-6458

Most cited papers

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Self-assembled monolayers as inhibitors for area-selective deposition: A novel approach towards resist-less EUV lithography
Lodha, J. K., Pollentier, I., Conard, T., Vallat, R., De Gendt, S., & Armini, S. (2022) · Applied Surface Science
Advancements in Photolithography TechniquesNanofabrication and Lithography Techniques
Cited by 16

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