Kim, Ryoung-Han

IMEC

1 paper on CoChatORCID 0009-0002-3327-5169

Most cited papers

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Exploration of alternative mask for 0.33NA extreme ultraviolet single patterning at pitch 28-nm metal design
Xu, D., Gillijns, W., Tan, L. E., Philipsen, V., & Kim, R.-H. (2022) · Journal of Micro/Nanopatterning, Materials, and Metrology
Advancements in Photolithography TechniquesAdvanced X-ray Imaging Techniques
Cited by 5

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