Conard, Thierry

Self-assembled monolayers as inhibitors for area-selective deposition: A novel approach towards resist-less EUV lithography

Lodha, J. K., Pollentier, I., Conard, T., Vallat, R., De Gendt, S., & Armini, S. (2022) · Applied Surface Science

Advancements in Photolithography TechniquesNanofabrication and Lithography Techniques

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Argon-Milling-Induced Decoherence Mechanisms in Superconducting Quantum Circuits

Van Damme, J., Ivanov, T., Favia, P., Conard, T., Verjauw, J., Acharya, R., Perez Lozano, D., Raes, B., Van de Vondel, J., Vadiraj, A. M., et al. (2023) · Physical Review Applied

Quantum Information and CryptographySuperconducting and THz Device Technology

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