Mesilhy, Hazem M. S.

Fraunhofer Institute for Integrated Systems and Device Technology

1 paper on CoChatORCID 0000-0003-0330-7115

Most cited papers

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Study of novel EUVL mask absorber candidates
Wu, M., Thakare, D., de Marneffe, J.-F., Jaenen, P., Souriau, L., Opsomer, K., Soulié, J.-P., Erdmann, A., Mesilhy, H. M. S., Naujok, P., et al. (2021) · Journal of Micro/Nanopatterning, Materials, and Metrology
Advancements in Photolithography TechniquesAdvanced X-ray Imaging Techniques
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