Thakare, Devesh

Study of novel EUVL mask absorber candidates

Wu, M., Thakare, D., de Marneffe, J.-F., Jaenen, P., Souriau, L., Opsomer, K., Soulié, J.-P., Erdmann, A., Mesilhy, H. M. S., Naujok, P., et al. (2021) · Journal of Micro/Nanopatterning, Materials, and Metrology

Advancements in Photolithography TechniquesAdvanced X-ray Imaging Techniques

Cited by 29

Optimizing extreme ultraviolet lithography imaging metrics as a function of absorber thickness and illumination source: a simulation case study of Ta-Co alloy

Thakare, D., Delabie, A., & Philipsen, V. (2023) · Journal of Micro/Nanopatterning, Materials, and Metrology

Advancements in Photolithography TechniquesAdvanced X-ray Imaging Techniques

Cited by 8