Fomenkov, Igor
ASML (Netherlands)
2 papers on CoChat
Most cited papers
- Verified
EUV lithography performance for manufacturing: status and outlook
Pirati, A., Peeters, R., Smith, D., Lok, S., van Noordenburg, M., van Es, R., Verhoeven, E., Meijer, H., Minnaert, A., van der Horst, J.-W., et al. (2016) · SPIE Proceedings
Advancements in Photolithography TechniquesAdvanced X-ray Imaging Techniques
Cited by 95
- Verified
LPP source system development for HVM
Brandt, D. C., Fomenkov, I. V., Ershov, A. I., Partlo, W. N., Myers, D. W., Sandstrom, R. L., La Fontaine, B. M., Lercel, M. J., Bykanov, A. N., Böwering, N. R., et al. (2011) · SPIE Proceedings
Advancements in Photolithography TechniquesAdvanced X-ray Imaging Techniques
Cited by 14
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