Li, Da

Lam Research (United States)

1 paper on CoChatORCID 0000-0003-3407-6858

Most cited papers

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Achieving zero EUV patterning defect with dry photoresist system
Alvi, M., Gottscho, R., Haider, A., Heo, S., Hsieh, P., Huang, C.-C., Jurczak, G., Kam, B., Kim, J. Y., Li, B., et al. (2022) · Advances in Patterning Materials and Processes XXXIX
Advancements in Photolithography TechniquesNanofabrication and Lithography Techniques
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