Weidman, Timothy

Achieving zero EUV patterning defect with dry photoresist system

Alvi, M., Gottscho, R., Haider, A., Heo, S., Hsieh, P., Huang, C.-C., Jurczak, G., Kam, B., Kim, J. Y., Li, B., et al. (2022) · Advances in Patterning Materials and Processes XXXIX

Advancements in Photolithography TechniquesNanofabrication and Lithography Techniques

Cited by 10

Infrared nanospectroscopy characterization of metal oxide photoresists

Zhao, X., Wu, C. H. (., Bechtel, H. A., Weidman, T., & Salmeron, M. B. (2022) · Journal of Micro/Nanopatterning, Materials, and Metrology

Advancements in Photolithography TechniquesSpectroscopy Techniques in Biomedical and Chemical Research

Cited by 2