Hansen, Steven

ASML (United States)

1 paper on CoChatORCID 0000-0002-2518-5342

Most cited papers

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EUV source-mask optimization for 7nm node and beyond
Liu, X., Howell, R., Hsu, S., Yang, K., Gronlund, K., Driessen, F., Liu, H.-Y., Hansen, S., van Ingen Schenau, K., Hollink, T., et al. (2014) · SPIE Proceedings
Advancements in Photolithography TechniquesAdvanced X-ray Imaging Techniques
Cited by 28

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