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Cited by 159

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Non‐Close‐Packed Crystals from Self‐Assembled Polystyrene Spheres by Isotropic Plasma Etching: Adding Flexibility to Colloid Lithography

Plettl, Alfred, Enderle, Fabian, Saitner, Marc, Manzke, Achim, Pfahler, Christian, Wiedemann, Stefan, Ziemann, Paul·2009·Advanced Functional Materials

Abstract

Hexagonally ordered arrays of non‐close‐packed nanoscaled spherical polystyrene (PS) particles are prepared exhibiting precisely controlled diameters and interparticle distances. For this purpose, a newly developed isotropic plasma etching process is applied to extended monolayers of PS colloids (starting diameters <300 nm) deposited onto hydrophilic silicon. Accurate size, shape, and smoothness control of such particles is accomplished by etching at low temperatures (−150 °C) with small rates not usually available in standard reactive ion etching equipment. The applicability of such PS arrays as masks for subsequent pattern transfer is demonstrated by fabricating arrays of cylindrical nanopores into Si.

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Metadata

Authors
Plettl, A., Enderle, F., Saitner, M., Manzke, A., Pfahler, C., Wiedemann, S., & Ziemann, P.
Venue
Advanced Functional Materials
Publisher
Wiley
Published
2009-10-22
Volume
19
Issue
20
Pages
3279-3284
ISSN
  • 1616-301X (ISSN-L)
  • 1616-3028
OpenAlex
W2146808345
Cited by
159
References
0
FWCI
6.79
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: Non‐Close‐Packed Crystals from Self‐Assembled Polystyrene Spheres by Isotropic Plasma Etching: Adding Flexibility to Colloid Lithography. https://app.cochat.ai/papers/10.1002/adfm.200900907
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Plettl, A., Enderle, F., Saitner, M., Manzke, A., Pfahler, C., Wiedemann, S., & Ziemann, P. (2009). Non‐Close‐Packed Crystals from Self‐Assembled Polystyrene Spheres by Isotropic Plasma Etching: Adding Flexibility to Colloid Lithography. Advanced Functional Materials. https://doi.org/10.1002/adfm.200900907

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