The DOI matches its Crossref record; 531 of the 531 references it cites were found in a registry or an index.
Two‐Photon Polymerization Lithography for Optics and Photonics: Fundamentals, Materials, Technologies, and Applications
Open accessAbstract
The rapid development of additive manufacturing has fueled a revolution in various research fields and industrial applications. Among the myriad of advanced 3D printing techniques, two‐photon polymerization lithography (TPL) uniquely offers a significant advantage in nanoscale print resolution, and has been widely employed in diverse fields, for example, life sciences, materials sciences, mechanics, and microfluidics. More recently, by virtue of the optical transparency of most of the resins used, TPL is finding new applications in optics and photonics, with nanometer to millimeter feature dimensions. It enables the minimization of optical elements and systems, and exploration of light‐matter interactions with new degrees of freedom, never possible before. To review the recent progress in the TPL related optical research, it starts with the fundamentals of TPL and material formulation, then discusses novel fabrication methods, and a wide range of optical applications. These applications notably include diffractive, topological, quantum, and color optics. With a panoramic view of the development, it is concluded with insights and perspectives of the future development of TPL and related potential optical applications.
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Cites
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Cited by
Ultrafast Laser Direct Writing Nanogratings and their Engineering in Transparent Materials
Yao, H., Pugliese, D., Lancry, M., & Dai, Y. (2024) · Laser & Photonics Reviews · doi:10.1002/lpor.202300891 · Cited by 115
Metadata
- Authors
- Wang, H., Zhang, W., Ladika, D., Yu, H., Gailevičius, D., Wang, H., Pan, C., Nair, P. N. S., Ke, Y., Mori, T., Chan, J. Y. E., Ruan, Q., Farsari, M., Malinauskas, M., Juodkazis, S., Gu, M., & Yang, J. K. W.
- Venue
- Advanced Functional Materials
- Publisher
- Wiley
- Published
- 2023-03-22
- Volume
- 33
- Issue
- 39
- ISSN
- 1616-301X (ISSN-L)
- 1616-3028
- OpenAlex
- W4360619193
- Cited by
- 401
- References
- 531
- FWCI
- 29.42
- Type
- journal article
- Language
- en
- Open access
- hybrid
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- Wang, H., Zhang, W., Ladika, D., Yu, H., Gailevičius, D., Wang, H., Pan, C., Nair, P. N. S., Ke, Y., Mori, T., Chan, J. Y. E., Ruan, Q., Farsari, M., Malinauskas, M., Juodkazis, S., Gu, M., & Yang, J. K. W. (2023). Two‐Photon Polymerization Lithography for Optics and Photonics: Fundamentals, Materials, Technologies, and Applications. Advanced Functional Materials. https://doi.org/10.1002/adfm.202214211
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Bibliographic data: Semantic Scholar, OpenAlex, Crossref.
Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).
Semantic Scholar’s data is described in: Kinney, R., et al. (2023). The Semantic Scholar Open Data Platform. arXiv:2301.10140.
