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Synthesis and Surface Engineering of Complex Nanostructures by Atomic Layer Deposition
Abstract
Atomic layer deposition (ALD) has recently become the method of choice for the semiconductor industry to conformally process extremely thin insulating layers (high‐k oxides) onto large‐area silicon substrates. ALD is also a key technology for the surface modification of complex nanostructured materials. After briefly introducing ALD, this Review will focus on the various aspects of nanomaterials and their processing by ALD, including nanopores, nanowires and ‐tubes, nanopatterning and nanolaminates as well as low‐temperature ALD for organic nanostructures and biomaterials. Finally, selected examples will be given of device applications, illustrating recent innovative approaches of how ALD can be used in nanotechnology.
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Cited by
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Zhang, J., Li, Y., Zhang, X., & Yang, B. (2010) · Advanced Materials · doi:10.1002/adma.201000755 · Cited by 649
Harris, K. D., Elias, A. L., & Chung, H.-J. (2016) · Journal of Materials Science · doi:10.1007/s10853-015-9643-3 · Cited by 403
Tailoring nanoporous materials by atomic layer deposition
Detavernier, C., Dendooven, J., Pulinthanathu Sree, S., Ludwig, K. F., & Martens, J. A. (2011) · Chemical Society Reviews · doi:10.1039/c1cs15091j · Cited by 386
Jung, Y. S., Cavanagh, A. S., Dillon, A. C., Groner, M. D., George, S. M., & Lee, S.-H. (2010) · Journal of The Electrochemical Society · doi:10.1149/1.3258274 · Cited by 361
Metadata
- Authors
- Knez, M., Nielsch, K., & Niinistö, L.
- Venue
- Advanced Materials
- Publisher
- Wiley
- Published
- 2007-10-02
- Volume
- 19
- Issue
- 21
- Pages
- 3425-3438
- ISSN
- 0935-9648 (ISSN-L)
- 1521-4095
- OpenAlex
- W2122271644
- Cited by
- 889
- References
- 0
- FWCI
- 35.91
- Type
- journal article
- Language
- en
- Open access
- closed
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- Knez, M., Nielsch, K., & Niinistö, L. (2007). Synthesis and Surface Engineering of Complex Nanostructures by Atomic Layer Deposition. Advanced Materials. https://doi.org/10.1002/adma.200700079
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