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Hole–Mask Colloidal Lithography
Abstract
Hole-mask colloidal lithography (HCL) represents a truly versatile and simple bottom-up nanofabrication method based on colloidal self-assembly lithographic patterning. The HCL technique provides an effective means of patterning vast surface areas with diverse functional nanoarchitectures. Examples include arrays of nanodiscs, oriented elliptical nanostructures, (binary) nanodisc pairs, nanocones on extended surfaces and nanodiscs embedded in a surrounding matrix.
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Cited by
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Self-citationLSPR Chip for Parallel, Rapid, and Sensitive Detection of Cancer Markers in Serum
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Metadata
- Authors
- Fredriksson, H., Alaverdyan, Y., Dmitriev, A., Langhammer, C., Sutherland, D. S., Zäch, M., & Kasemo, B.
- Venue
- Advanced Materials
- Publisher
- Wiley
- Published
- 2007-11-29
- Volume
- 19
- Issue
- 23
- Pages
- 4297-4302
- ISSN
- 0935-9648 (ISSN-L)
- 1521-4095
- OpenAlex
- W2030814280
- Cited by
- 564
- References
- 0
- FWCI
- 13.49
- Type
- journal article
- Language
- en
- Open access
- closed
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- Fredriksson, H., Alaverdyan, Y., Dmitriev, A., Langhammer, C., Sutherland, D. S., Zäch, M., & Kasemo, B. (2007). Hole–Mask Colloidal Lithography. Advanced Materials. https://doi.org/10.1002/adma.200700680
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Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).
Semantic Scholar’s data is described in: Kinney, R., et al. (2023). The Semantic Scholar Open Data Platform. arXiv:2301.10140.
