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Cited by 180

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One‐Step Direct‐Patterning Template Utilizing Self‐Assembly of POSS‐Containing Block Copolymers

Hirai, Tomoyasu, Leolukman, Melvina, Liu, Chi Chun, Han, Eungnak, Kim, Yun Jun, Ishida, Yoshihito, Hayakawa, Teruaki, Kakimoto, Masa‐aki, Nealey, Paul F., Gopalan, Padma·2009·Advanced Materials

Abstract

We report the self-assembly of organic-inorganic block copolymers (BCP) in thin-films by simple solvent annealing on unmodified substrates. The resulting vertically oriented lamellae and cylinders are converted to a hard silica mask by a single step highly selective oxygen plasma etching. The size of the resulting nanostructures in the case of cylinders is less than 10 nm.

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Metadata

Authors
Hirai, T., Leolukman, M., Liu, C. C., Han, E., Kim, Y. J., Ishida, Y., Hayakawa, T., Kakimoto, M., Nealey, P. F., & Gopalan, P.
Venue
Advanced Materials
Publisher
Wiley
Published
2009-11-19
Volume
21
Issue
43
Pages
4334-4338
ISSN
  • 0935-9648 (ISSN-L)
  • 1521-4095
OpenAlex
W2034205871
Cited by
180
References
0
FWCI
5.90
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: One‐Step Direct‐Patterning Template Utilizing Self‐Assembly of POSS‐Containing Block Copolymers. https://app.cochat.ai/papers/10.1002/adma.200900518
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Hirai, T., Leolukman, M., Liu, C. C., Han, E., Kim, Y. J., Ishida, Y., Hayakawa, T., Kakimoto, M., Nealey, P. F., & Gopalan, P. (2009). One‐Step Direct‐Patterning Template Utilizing Self‐Assembly of POSS‐Containing Block Copolymers. Advanced Materials. https://doi.org/10.1002/adma.200900518

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Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).

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