The DOI matches its Crossref record; 1 of the 1 references it cites were found in a registry or an index.
Controlled Doping of Large‐Area Trilayer MoS2 with Molecular Reductants and Oxidants
Abstract
Highly uniform large-area MoS2 is chemically doped using molecular reductants and oxidants. Electrical measurements, photoemission, and Raman spectroscopy are used to study the doping effect and to understand the underlying mechanism. Strong work-function changes of up to ±1 eV can be achieved, with contributions from state filling and surface dipoles. This results in high doping densities of up to ca. 8 × 10(12) cm(-2) .
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Citations
Cites
Piezoelectricity of single-atomic-layer MoS2 for energy conversion and piezotronics
Wu, W., Wang, L., Li, Y., Zhang, F., Lin, L., Niu, S., Chenet, D., Zhang, X., Hao, Y., Heinz, T. F., et al. (2014) · Nature · doi:10.1038/nature13792 · Cited by 2,287
Cited by
Li, C., Cao, Q., Wang, F., Xiao, Y., Li, Y., Delaunay, J.-J., & Zhu, H. (2018) · Chemical Society Reviews · doi:10.1039/c8cs00067k · Cited by 494
Samadi, M., Sarikhani, N., Zirak, M., Zhang, H., Zhang, H.-L., & Moshfegh, A. Z. (2018) · Nanoscale Horizons · doi:10.1039/c7nh00137a · Cited by 408
Doping engineering and functionalization of two-dimensional metal chalcogenides
Luo, P., Zhuge, F., Zhang, Q., Chen, Y., Lv, L., Huang, Y., Li, H., & Zhai, T. (2019) · Nanoscale Horizons · doi:10.1039/c8nh00150b · Cited by 339
Ru, P., Bi, E., Zhang, Y., Wang, Y., Kong, W., Sha, Y., Tang, W., Zhang, P., Wu, Y., Chen, W., et al. (2020) · Advanced Energy Materials · doi:10.1002/aenm.201903487 · Cited by 298
Joseph, S., Mohan, J., Lakshmy, S., Thomas, S., Chakraborty, B., Thomas, S., & Kalarikkal, N. (2023) · Materials Chemistry and Physics · doi:10.1016/j.matchemphys.2023.127332 · Cited by 284
Metadata
- Authors
- Tarasov, A., Zhang, S., Tsai, M., Campbell, P. M., Graham, S., Barlow, S., Marder, S. R., & Vogel, E. M.
- Venue
- Advanced Materials
- Publisher
- Wiley
- Published
- 2015-01-07
- Volume
- 27
- Issue
- 7
- Pages
- 1175-1181
- ISSN
- 0935-9648 (ISSN-L)
- 1521-4095
- OpenAlex
- W1993175930
- Cited by
- 218
- References
- 1
- FWCI
- 10.92
- Type
- journal article
- Language
- en
- Open access
- closed
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- Tarasov, A., Zhang, S., Tsai, M., Campbell, P. M., Graham, S., Barlow, S., Marder, S. R., & Vogel, E. M. (2015). Controlled Doping of Large‐Area Trilayer MoS2 with Molecular Reductants and Oxidants. Advanced Materials. https://doi.org/10.1002/adma.201404578
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