The DOI matches its Crossref record; 2 of the 2 references it cites were found in a registry or an index.
Parallel Stitching of 2D Materials
Open accessAbstract
Diverse parallel stitched 2D heterostructures, including metal-semiconductor, semiconductor-semiconductor, and insulator-semiconductor, are synthesized directly through selective "sowing" of aromatic molecules as the seeds in the chemical vapor deposition (CVD) method. The methodology enables the large-scale fabrication of lateral heterostructures, which offers tremendous potential for its application in integrated circuits.
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Cites
Physics of Semiconductor Devices
Sze, S. M., & Ng, K. K. (2006) · doi:10.1002/0470068329 · Cited by 14,627
Graphene–MoS2 hybrid structures for multifunctional photoresponsive memory devices
Roy, K., Padmanabhan, M., Goswami, S., Sai, T. P., Ramalingam, G., Raghavan, S., & Ghosh, A. (2013) · Nature Nanotechnology · doi:10.1038/nnano.2013.206 · Cited by 1,436
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Two-dimensional transistors beyond graphene and TMDCs
Liu, Y., Duan, X., Huang, Y., & Duan, X. (2018) · Chemical Society Reviews · doi:10.1039/c8cs00318a · Cited by 474
Li, H., Li, Y., Aljarb, A., Shi, Y., & Li, L.-J. (2018) · Chemical Reviews · doi:10.1021/acs.chemrev.7b00212 · Cited by 382
Metadata
- Authors
- Ling, X., Lin, Y., Ma, Q., Wang, Z., Song, Y., Yu, L., Huang, S., Fang, W., Zhang, X., Hsu, A. L., Bie, Y., Lee, Y., Zhu, Y., Wu, L., Li, J., Jarillo‐Herrero, P., Dresselhaus, M., Palacios, T., & Kong, J.
- Venue
- Advanced Materials
- Publisher
- Wiley
- Published
- 2016-01-27
- Volume
- 28
- Issue
- 12
- Pages
- 2322-2329
- ISSN
- 0935-9648 (ISSN-L)
- 1521-4095
- OpenAlex
- W2208811766
- Cited by
- 224
- References
- 2
- FWCI
- 17.46
- Type
- journal article
- Language
- en
- Open access
- green
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- Ling, X., Lin, Y., Ma, Q., Wang, Z., Song, Y., Yu, L., Huang, S., Fang, W., Zhang, X., Hsu, A. L., Bie, Y., Lee, Y., Zhu, Y., Wu, L., Li, J., Jarillo‐Herrero, P., Dresselhaus, M., Palacios, T., & Kong, J. (2016). Parallel Stitching of 2D Materials. Advanced Materials. https://doi.org/10.1002/adma.201505070
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