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Cited by 537

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Van der Waals Heterostructures for High‐Performance Device Applications: Challenges and Opportunities

Open access
Liang, Shi‐Jun, Cheng, Bin, Cui, Xinyi, Miao, Feng·2020·Advanced Materials

Abstract

The discovery of two‐dimensional (2D) materials with unique electronic, superior optoelectronic, or intrinsic magnetic order has triggered worldwide interest in the fields of material science, condensed matter physics, and device physics. Vertically stacking 2D materials with distinct electronic and optical as well as magnetic properties enables the creation of a large variety of van der Waals heterostructures. The diverse properties of the vertical heterostructures open unprecedented opportunities for various kinds of device applications, e.g., vertical field‐effect transistors, ultrasensitive infrared photodetectors, spin‐filtering devices, and so on, which are inaccessible in conventional material heterostructures. Here, the current status of vertical heterostructure device applications in vertical transistors, infrared photodetectors, and spintronic memory/transistors is reviewed. The relevant challenges for achieving high‐performance devices are presented. An outlook into the future development of vertical heterostructure devices with integrated electronic and optoelectronic as well as spintronic functionalities is also provided.

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Metadata

Authors
Liang, S., Cheng, B., Cui, X., & Miao, F.
Venue
Advanced Materials
Publisher
Wiley
Published
2019-10-14
Volume
32
Issue
27
Pages
e1903800-e1903800
ISSN
  • 0935-9648 (ISSN-L)
  • 1521-4095
OpenAlex
W2979982537
Cited by
537
References
6
FWCI
17.45
Type
journal article
Language
en
Open access
green

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CoChat. (2026). Citation check: Van der Waals Heterostructures for High‐Performance Device Applications: Challenges and Opportunities. https://app.cochat.ai/papers/10.1002/adma.201903800
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Liang, S., Cheng, B., Cui, X., & Miao, F. (2020). Van der Waals Heterostructures for High‐Performance Device Applications: Challenges and Opportunities. Advanced Materials. https://doi.org/10.1002/adma.201903800

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