The DOI matches its Crossref record; 1 of the 1 references it cites were found in a registry or an index.
Recent progress in high resolution lithography
Abstract
The nanotechnology revolution of the past decade owes much to the science of lithography, an umbrella term which encompasses everything from conventional photolithography to “unconventional” soft lithography and the self‐assembly of block polymers. In this review, some of the recent advances in lithography are summarized with special reference to the microelectronics industry. The next generation photolithography, two‐photon lithography, step‐and‐flash imprint lithography and nanofabrication using block copolymers are covered, in an attempt to describe more recent work in this vibrant and active field of research. Copyright © 2006 John Wiley & Sons, Ltd.
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Finer features for functional microdevices
Kawata, S., Sun, H.-B., Tanaka, T., & Takada, K. (2001) · Nature · doi:10.1038/35089130 · Cited by 2,871
Cited by
Using Cylindrical Domains of Block Copolymers To Self-Assemble and Align Metallic Nanowires
Chai, J., & Buriak, J. M. (2008) · ACS Nano · doi:10.1021/nn700341s · Cited by 317
Li, L., Chakrabarty, S., Spyrou, K., Ober, C. K., & Giannelis, E. P. (2015) · Chemistry of Materials · doi:10.1021/acs.chemmater.5b01506 · Cited by 126
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Metadata
- Authors
- Bratton, D., Yang, D., Dai, J., & Ober, C. K.
- Venue
- Polymers for Advanced Technologies
- Publisher
- Wiley
- Published
- 2006-01-17
- Volume
- 17
- Issue
- 2
- Pages
- 94-103
- ISSN
- 1042-7147 (ISSN-L)
- 1099-1581
- OpenAlex
- W2011963980
- Cited by
- 260
- References
- 1
- FWCI
- 18.56
- Type
- journal article
- Language
- en
- Open access
- closed
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- Bratton, D., Yang, D., Dai, J., & Ober, C. K. (2006). Recent progress in high resolution lithography. Polymers for Advanced Technologies. https://doi.org/10.1002/pat.662
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