Cited by 111CCD and CMOS Imaging SensorsPlasmonic and Surface Plasmon ResearchThin-Film Transistor Technologies

A CMOS Image Sensor Integrated with Plasmonic Colour Filters

Chen, Q., Das, D., Chitnis, D., Walls, K., Drysdale, T. D., Collins, S., Cumming, D. R. S.·2012·Plasmonics

Integrity signals

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Crossref · 10.1007/s11468-012-9360-6

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  • Initial investigations into metasurface spectral filters used plasmonic metals, but there has been a gradual shift towards all-dielectric metasurfaces owing to their comparatively lesser optical absorption.

    “Initial investigations into metasurface spectral filters used plasmonic metals [8–13], but there has been a gradual shift towards all-dielectric metasurfaces (ADM) [14–17] owing to their comparatively lesser optical absorption.”

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Authors
Chen, Q., Das, D., Chitnis, D., Walls, K., Drysdale, T. D., Collins, S., & Cumming, D. R. S.
Affiliations
  • University of Glasgow (GB)
  • University of Oxford (GB)
Corresponding author
Cumming, D. R. S.
Venue
Plasmonics
Published
2012-03-27
Volume
7
Issue
4
Pages
695-699
ISSN
  • 1557-1955 (ISSN-L)
  • 1557-1963
OpenAlex
W2133987419
Cited by
111
References
0
Citations by year
2026: 2 · 2025: 3 · 2024: 3 · 2023: 3 · 2022: 2 · 2021: 9 · 2020: 7 · 2019: 11 · 2018: 11 · 2017: 10 · 2016: 15 · 2015: 13 · 2014: 10 · 2013: 9 · 2012: 3
FWCI
7.16
Type
journal article
Language
en
Open access
closed
Locations
  • Plasmonics (publishedVersion)
  • ENLIGHTEN (Jurnal Bimbingan dan Konseling Islam) (submittedVersion)
Funders
Engineering and Physical Sciences Research Council (EP/D501288/1, EP/G006784/1)
Topics
  • Physical Sciences › Engineering › Electrical and Electronic Engineering › CCD and CMOS Imaging Sensors
  • Physical Sciences › Engineering › Biomedical Engineering › Plasmonic and Surface Plasmon Research
  • Physical Sciences › Engineering › Electrical and Electronic Engineering › Thin-Film Transistor Technologies
Keywords
CMOS image sensor, subwavelength holes, aluminum thin films, electron beam lithography, dry etching, visible light sensitivity, one-step fabrication, crosstalk reduction

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