The DOI matches its Crossref record; 3 of the 3 references it cites were found in a registry or an index.
An innovative way of etching MoS2: Characterization and mechanistic investigation
Open accessAbstract
We report a systematic study of the etching of MoS2 crystals by using XeF2 as a gaseous reactant. By controlling the etching process, monolayer MoS2 with uniform morphology can be obtained. The Raman and photoluminescence spectra of the resulting material were similar to those of exfoliated MoS2. Utilizing this strategy, different patterns such as a Hall bar structure and a hexagonal array can be realized. Furthermore, the etching mechanism was studied by introducing graphene as an etching mask. We believe our technique opens an easy and controllable way of etching MoS2, which can be used to fabricate complex nanostructures, such as nanoribbons, quantum dots, and transistor structures. This etching process using XeF2 can also be extended to other interesting two-dimensional crystals.
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Cites
Two-dimensional gas of massless Dirac fermions in graphene
Novoselov, K. S., Geim, A. K., Morozov, S. V., Jiang, D., Katsnelson, M. I., Grigorieva, I. V., Dubonos, S. V., & Firsov, A. A. (2005) · Nature · doi:10.1038/nature04233 · Cited by 21,611
Narrow graphene nanoribbons from carbon nanotubes
Jiao, L., Zhang, L., Wang, X., Diankov, G., & Dai, H. (2009) · Nature · doi:10.1038/nature07919 · Cited by 2,441
Chen, Z., Cummins, D., Reinecke, B. N., Clark, E., Sunkara, M. K., & Jaramillo, T. F. (2011) · Nano Letters · doi:10.1021/nl2020476 · Cited by 1,153
Cited by
Covalent Nitrogen Doping and Compressive Strain in MoS2 by Remote N2 Plasma Exposure
Azcatl, A., Qin, X., Prakash, A., Zhang, C., Cheng, L., Wang, Q., Lu, N., Kim, M. J., Kim, J., Cho, K., et al. (2016) · Nano Letters · doi:10.1021/acs.nanolett.6b01853 · Cited by 491
Schmidt, H., Giustiniano, F., & Eda, G. (2015) · Chemical Society Reviews · doi:10.1039/c5cs00275c · Cited by 466
Self-citationSamadi, M., Sarikhani, N., Zirak, M., Zhang, H., Zhang, H.-L., & Moshfegh, A. Z. (2018) · Nanoscale Horizons · doi:10.1039/c7nh00137a · Cited by 408
Face the Edges: Catalytic Active Sites of Nanomaterials
Ni, B., & Wang, X. (2015) · Advanced Science · doi:10.1002/advs.201500085 · Cited by 219
Zhang, X., Jia, F., & Song, S. (2021) · Chemical Engineering Journal · doi:10.1016/j.cej.2020.127013 · Cited by 145
Metadata
- Authors
- Huang, Y., Wu, J., Xu, X., Ho, Y., Ni, G., Zou, Q., Koon, G. K. W., Zhao, W., Castro Neto, A. H., Eda, G., Shen, C., & Özyilmaz, B.
- Venue
- Nano Research
- Publisher
- Tsinghua University Press
- Published
- 2013-02-21
- Volume
- 6
- Issue
- 3
- Pages
- 200-207
- ISSN
- 1998-0000 (ISSN-L)
- 1998-0124
- OpenAlex
- W2116294656
- Cited by
- 159
- References
- 3
- FWCI
- 7.25
- Type
- journal article
- Language
- en
- Open access
- green
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- Huang, Y., Wu, J., Xu, X., Ho, Y., Ni, G., Zou, Q., Koon, G. K. W., Zhao, W., Castro Neto, A. H., Eda, G., Shen, C., & Özyilmaz, B. (2013). An innovative way of etching MoS2: Characterization and mechanistic investigation. Nano Research. https://doi.org/10.1007/s12274-013-0296-8
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