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Plasma-assisted fabrication of monolayer phosphorene and its Raman characterization

Open access
Lu, Wanglin, Nan, Haiyan, Hong, Jinhua, Chen, Yuming, Zhu, Chen, Liang, Zheng, Ma, Xiangyang, Ni, Zhenhua, Jin, Chuanhong, Zhang, Ze·2014·Nano Research

Abstract

There have been continuous efforts to seek novel functional two-dimensional semiconductors with high performance for future applications in nanoelectronics and optoelectronics. In this work, we introduce a successful experimental approach to fabricate monolayer phosphorene by mechanical cleavage and a subsequent Ar + plasma thinning process. The thickness of phosphorene is unambiguously determined by optical contrast spectra combined with atomic force microscopy (AFM). Raman spectroscopy is used to characterize the pristine and plasma-treated samples. The Raman frequency of the A 2g mode stiffens, and the intensity ratio of A 2g to A 1g modes shows a monotonic discrete increase with the decrease of phosphorene thickness down to a monolayer. All those phenomena can be used to identify the thickness of this novel two-dimensional semiconductor. This work on monolayer phosphorene fabrication and thickness determination will facilitate future research on phosphorene.

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Metadata

Authors
Lu, W., Nan, H., Hong, J., Chen, Y., Zhu, C., Liang, Z., Ma, X., Ni, Z., Jin, C., & Zhang, Z.
Venue
Nano Research
Published
2014-05-08
Volume
7
Issue
6
Pages
853-859
ISSN
  • 1998-0000 (ISSN-L)
  • 1998-0124
OpenAlex
W2026233175
Cited by
665
References
4
FWCI
34.10
Type
journal article
Language
en
Open access
green

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CoChat. (2026). Citation check: Plasma-assisted fabrication of monolayer phosphorene and its Raman characterization. https://app.cochat.ai/papers/10.1007/s12274-014-0446-7
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Lu, W., Nan, H., Hong, J., Chen, Y., Zhu, C., Liang, Z., Ma, X., Ni, Z., Jin, C., & Zhang, Z. (2014). Plasma-assisted fabrication of monolayer phosphorene and its Raman characterization. Nano Research. https://doi.org/10.1007/s12274-014-0446-7

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