The DOI matches its Crossref record; 3 of the 3 references it cites were found in a registry or an index.
Self-assembly of block copolymer thin films
Open accessAbstract
Block copolymers self-assemble on nanometer length scales, making them ideal for emerging nanotechnologies. Many applications (e.g., templating, membranes) require the use of block copolymers in thin film geometries (∼100 nm thickness), where self-assembly is strongly influenced by surface energetics. In this review, we discuss the roles of surface and interfacial effects on self-assembly, with a specific focus on confinement, substrate surface modification, and thermal and solvent annealing conditions. Finally, we comment on novel techniques for manipulating and characterizing thin films, motivating the use of gradient and high-throughput methods for gaining a comprehensive picture of self-assembly to enable advanced nanotechnologies.
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Cites
Interfacial segregation in disordered block copolymers: Effect of tunable surface potentials
Mansky, P., Russell, T. P., Hawker, C. J., Mays, J., Cook, D. C., & Satija, S. K. (1997) · Physical Review Letters · doi:10.1103/physrevlett.79.237 · Cited by 255
Microdomain Orientation of PS-b-PMMA by Controlled Interfacial Interactions
Ham, S., Shin, C., Kim, E., Ryu, D. Y., Jeong, U., Russell, T. P., & Hawker, C. J. (2008) · Macromolecules · doi:10.1021/ma8007338 · Cited by 238
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Cited by
New Insights into Perfluorinated Sulfonic-Acid Ionomers
Kusoglu, A., & Weber, A. Z. (2017) · Chemical Reviews · doi:10.1021/acs.chemrev.6b00159 · Cited by 2,432
Polarity-switching top coats enable orientation of sub-10-nm block copolymer domains
Bates, C. M., Seshimo, T., Maher, M. J., Durand, W. J., Cushen, J. D., Dean, L. M., Blachut, G., Ellison, C. J., & Willson, C. G. (2012) · Science · doi:10.1126/science.1226046 · Cited by 385
Miyake, G. M., Weitekamp, R. A., Piunova, V. A., & Grubbs, R. H. (2012) · Journal of the American Chemical Society · doi:10.1021/ja306430k · Cited by 265
Oligosaccharide/silicon-containing block copolymers with 5 nm features for lithographic applications
Cushen, J. D., Otsuka, I., Bates, C. M., Halila, S., Fort, S., Rochas, C., Easley, J. A., Rausch, E. L., Thio, A., Borsali, R., et al. (2012) · ACS Nano · doi:10.1021/nn300459r · Cited by 211
Cyclic block copolymers for controlling feature sizes in block copolymer lithography
Poelma, J. E., Ono, K., Miyajima, D., Aida, T., Satoh, K., & Hawker, C. J. (2012) · ACS Nano · doi:10.1021/nn304217y · Cited by 189
Metadata
- Authors
- Albert, J. N. L., & Epps, T. H.
- Venue
- Materials Today
- Publisher
- Elsevier BV
- Published
- 2010-06
- Volume
- 13
- Issue
- 6
- Pages
- 24-33
- ISSN
- 1369-7021 (ISSN-L)
- OpenAlex
- W1982271883
- Cited by
- 509
- References
- 3
- FWCI
- 14.67
- Type
- journal article
- Language
- en
- Open access
- hybrid
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