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Improved Contacts to MoS2 Transistors by Ultra-High Vacuum Metal Deposition
Open accessAbstract
The scaling of transistors to sub-10 nm dimensions is strongly limited by their contact resistance (RC). Here we present a systematic study of scaling MoS2 devices and contacts with varying electrode metals and controlled deposition conditions, over a wide range of temperatures (80 to 500 K), carrier densities (10(12) to 10(13) cm(-2)), and contact dimensions (20 to 500 nm). We uncover that Au deposited in ultra-high vacuum (∼10(-9) Torr) yields three times lower RC than under normal conditions, reaching 740 Ω·μm and specific contact resistivity 3 × 10(-7) Ω·cm(2), stable for over four months. Modeling reveals separate RC contributions from the Schottky barrier and the series access resistance, providing key insights on how to further improve scaling of MoS2 contacts and transistor dimensions. The contact transfer length is ∼35 nm at 300 K, which is verified experimentally using devices with 20 nm contacts and 70 nm contact pitch (CP), equivalent to the "14 nm" technology node.
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Tunneling in a finite superlattice
Tsu, R., & Esaki, L. (1973) · Applied Physics Letters · doi:10.1063/1.1654509 · Cited by 2,371
Cited by
Two-dimensional transistors beyond graphene and TMDCs
Liu, Y., Duan, X., Huang, Y., & Duan, X. (2018) · Chemical Society Reviews · doi:10.1039/c8cs00318a · Cited by 474
Wang, Y., Sarkar, S., Yan, H., & Chhowalla, M. (2024) · Nature Electronics · doi:10.1038/s41928-024-01210-3 · Cited by 183
Metadata
- Authors
- English, C. D., Shine, G., Dorgan, V. E., Saraswat, K. C., & Pop, E.
- Venue
- Nano Letters
- Publisher
- American Chemical Society (ACS)
- Published
- 2016-05-27
- Volume
- 16
- Issue
- 6
- Pages
- 3824-3830
- ISSN
- 1530-6984 (ISSN-L)
- 1530-6992
- OpenAlex
- W2396859594
- Cited by
- 554
- References
- 1
- FWCI
- 23.57
- Type
- journal article
- Language
- en
- Open access
- green
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- English, C. D., Shine, G., Dorgan, V. E., Saraswat, K. C., & Pop, E. (2016). Improved Contacts to MoS2 Transistors by Ultra-High Vacuum Metal Deposition. Nano Letters. https://doi.org/10.1021/acs.nanolett.6b01309
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