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Highly Enhanced Gas Adsorption Properties in Vertically Aligned MoS2 Layers

Cho, Soo-Yeon, Kim, Seon Joon, Lee, Youhan, Kim, Jong-Seon, Jung, Woo-Bin, Yoo, Hae-Wook, Kim, Jihan, Jung, Hee-Tae·2015·ACS Nano

Abstract

In this work, we demonstrate that gas adsorption is significantly higher in edge sites of vertically aligned MoS2 compared to that of the conventional basal plane exposed MoS2 films. To compare the effect of the alignment of MoS2 on the gas adsorption properties, we synthesized three distinct MoS2 films with different alignment directions ((1) horizontally aligned MoS2 (basal plane exposed), (2) mixture of horizontally aligned MoS2 and vertically aligned layers (basal and edge exposed), and (3) vertically aligned MoS2 (edge exposed)) by using rapid sulfurization method of CVD process. Vertically aligned MoS2 film shows about 5-fold enhanced sensitivity to NO2 gas molecules compared to horizontally aligned MoS2 film. Vertically aligned MoS2 has superior resistance variation compared to horizontally aligned MoS2 even with same surface area exposed to identical concentration of gas molecules. We found that electrical response to target gas molecules correlates directly with the density of the exposed edge sites of MoS2 due to high adsorption of gas molecules onto edge sites of vertically aligned MoS2. Density functional theory (DFT) calculations corroborate the experimental results as stronger NO2 binding energies are computed for multiple configurations near the edge sites of MoS2, which verifies that electrical response to target gas molecules (NO2) correlates directly with the density of the exposed edge sites of MoS2 due to high adsorption of gas molecules onto edge sites of vertically aligned MoS2. We believe that this observation extends to other 2D TMD materials as well as MoS2 and can be applied to significantly enhance the gas sensor performance in these materials.

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Metadata

Authors
Cho, S.-Y., Kim, S. J., Lee, Y., Kim, J.-S., Jung, W.-B., Yoo, H.-W., Kim, J., & Jung, H.-T.
Venue
ACS Nano
Published
2015-08-28
Volume
9
Issue
9
Pages
9314-9321
ISSN
  • 1936-0851 (ISSN-L)
  • 1936-086X
OpenAlex
W2423994870
Cited by
523
References
6
FWCI
15.40
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: Highly Enhanced Gas Adsorption Properties in Vertically Aligned MoS2 Layers. https://app.cochat.ai/papers/10.1021/acsnano.5b04504
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Cho, S.-Y., Kim, S. J., Lee, Y., Kim, J.-S., Jung, W.-B., Yoo, H.-W., Kim, J., & Jung, H.-T. (2015). Highly Enhanced Gas Adsorption Properties in Vertically Aligned MoS2 Layers. ACS Nano. https://doi.org/10.1021/acsnano.5b04504

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