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Cited by 171

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Robust Stacking-Independent Ultrafast Charge Transfer in MoS2/WS2 Bilayers

Ji, Ziheng, Hong, Hao, Zhang, Jin, Zhang, Qi, Huang, Wei, Cao, Ting, Qiao, Ruixi, Liu, Can, Liang, Jing, Jin, Chuanhong, Jiao, Liying, Shi, Kebin, Meng, Sheng, Liu, Kaihui·2017·ACS Nano

Abstract

Van der Waals-coupled two-dimensional (2D) heterostructures have attracted great attention recently due to their high potential in the next-generation photodetectors and solar cells. The understanding of charge-transfer process between adjacent atomic layers is the key to design optimal devices as it directly determines the fundamental response speed and photon-electron conversion efficiency. However, general belief and theoretical studies have shown that the charge transfer behavior depends sensitively on interlayer configurations, which is difficult to control accurately, bringing great uncertainties in device designing. Here we investigate the ultrafast dynamics of interlayer charge transfer in a prototype heterostructure, the MoS 2 /WS 2 bilayer with various stacking configurations, by optical two-color ultrafast pump–probe spectroscopy. Surprisingly, we found that the charge transfer is robust against varying interlayer twist angles and interlayer coupling strength, in time scale of ∼90 fs. Our observation, together with atomic-resolved transmission electron characterization and time-dependent density functional theory simulations, reveals that the robust ultrafast charge transfer is attributed to the heterogeneous interlayer stretching/sliding, which provides additional channels for efficient charge transfer previously unknown. Our results elucidate the origin of transfer rate robustness against interlayer stacking configurations in optical devices based on 2D heterostructures, facilitating their applications in ultrafast and high-efficient optoelectronic and photovoltaic devices in the near future.

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Crossref · 10.1021/acsnano.7b04541

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Metadata

Authors
Ji, Z., Hong, H., Zhang, J., Zhang, Q., Huang, W., Cao, T., Qiao, R., Liu, C., Liang, J., Jin, C., Jiao, L., Shi, K., Meng, S., & Liu, K.
Venue
ACS Nano
Published
2017-11-21
Volume
11
Issue
12
Pages
12020-12026
ISSN
  • 1936-0851 (ISSN-L)
  • 1936-086X
OpenAlex
W2767782528
Cited by
171
References
1
FWCI
6.89
Type
journal article
Language
en
Open access
closed

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