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Scalable Nanoimprint Lithography Process for Manufacturing Visible Metasurfaces Composed of High Aspect Ratio TiO2 Meta-Atoms
Abstract
We report a one-step additive manufacturing process to fabricate metalenses for visible wavelengths. Nanostructures with aspect ratios larger than eight and critical dimensions smaller than 60 nm were produced using nanoimprint lithography and a titanium dioxide nanocrystal-based imprint material, resulting in inorganic structures exhibiting a refractive index of n = 1.9. As a demonstration, we fabricate metalenses with numerical apertures (NAs) of 0.2 and focusing efficiencies over 50%. Manufacturability was assessed by performing 15 manual imprints in 30 min (2 min of process time per imprint) with a single stamp. All imprinted lenses exhibit comparable performance, paving the way for high-throughput and low-cost manufacturing of flat optical devices. Metalenses with a diameter of 4 mm were also fabricated to investigate the success of large area replication using this process, showing efficiencies of 43%, indicating good macroscopic imprinting.
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Cites
Analysis of material selection on dielectric metasurface performance
Yang, J., & Fan, J. A. (2017) · Optics Express · doi:10.1364/oe.25.023899 · Cited by 91
Cited by
Recent Advances in Tunable Metasurfaces: Materials, Design, and Applications
Abdelraouf, O. A. M., Wang, Z., Liu, H., Dong, Z., Wang, Q., Ye, M., Wang, X. R., Wang, Q. J., & Liu, H. (2022) · ACS Nano · doi:10.1021/acsnano.2c04628 · Cited by 265
Metadata
- Authors
- Einck, V. J., Torfeh, M., McClung, A., Jung, D. E., Mansouree, M., Arbabi, A., & Watkins, J. J.
- Venue
- ACS Photonics
- Publisher
- American Chemical Society (ACS)
- Published
- 2021-08-09
- Volume
- 8
- Issue
- 8
- Pages
- 2400-2409
- ISSN
- 2330-4022 (ISSN-L)
- OpenAlex
- W3190118328
- Cited by
- 168
- References
- 1
- FWCI
- 5.07
- Type
- journal article
- Language
- en
- Open access
- closed
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- CoChat. (2026). Citation check: Scalable Nanoimprint Lithography Process for Manufacturing Visible Metasurfaces Composed of High Aspect Ratio TiO2 Meta-Atoms. https://app.cochat.ai/papers/10.1021/acsphotonics.1c00609
- The paper
- Einck, V. J., Torfeh, M., McClung, A., Jung, D. E., Mansouree, M., Arbabi, A., & Watkins, J. J. (2021). Scalable Nanoimprint Lithography Process for Manufacturing Visible Metasurfaces Composed of High Aspect Ratio TiO2 Meta-Atoms. ACS Photonics. https://doi.org/10.1021/acsphotonics.1c00609
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Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).
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