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Advances in Patterning Materials for 193 nm Immersion Lithography
Abstract
ADVERTISEMENT RETURN TO ISSUEPREVReviewNEXTAdvances in Patterning Materials for 193 nm Immersion LithographyDaniel P. Sanders*View Author Information IBM Almaden Research Center, 650 Harry Road, San Jose, California 95136* Corresponding author: [email protected]Cite this: Chem. Rev. 2010, 110, 1, 321–360Publication Date (Web):January 13, 2010Publication History Received6 July 2009Published online13 January 2010Published inissue 13 January 2010https://pubs.acs.org/doi/10.1021/cr900244nhttps://doi.org/10.1021/cr900244nreview-articleACS PublicationsCopyright © 2010 American Chemical SocietyRequest reuse permissionsArticle Views8708Altmetric-Citations209LEARN ABOUT THESE METRICSArticle Views are the COUNTER-compliant sum of full text article downloads since November 2008 (both PDF and HTML) across all institutions and individuals. These metrics are regularly updated to reflect usage leading up to the last few days.Citations are the number of other articles citing this article, calculated by Crossref and updated daily. Find more information about Crossref citation counts.The Altmetric Attention Score is a quantitative measure of the attention that a research article has received online. Clicking on the donut icon will load a page at altmetric.com with additional details about the score and the social media presence for the given article. Find more information on the Altmetric Attention Score and how the score is calculated. Share Add toView InAdd Full Text with ReferenceAdd Description ExportRISCitationCitation and abstractCitation and referencesMore Options Share onFacebookTwitterWechatLinked InRedditEmail Other access optionsGet e-Alertsclose SUBJECTS:Additives,Fluids,Lithography,Materials,Optical properties Get e-Alerts
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Cited by
Evolution in Lithography Techniques: Microlithography to Nanolithography
Sharma, E., Rathi, R., Misharwal, J., Sinhmar, B., Kumari, S., Dalal, J., & Kumar, A. (2022) · Nanomaterials · doi:10.3390/nano12162754 · Cited by 257
Review of recent advances in inorganic photoresists
Luo, C., Xu, C., Lv, L., Li, H., Huang, X., & Liu, W. (2020) · RSC Advances · doi:10.1039/c9ra08977b · Cited by 207
Ultrahigh-printing-speed photoresists for additive manufacturing
Liu, T., Tao, P., Wang, X., Wang, H., He, M., Wang, Q., Cui, H., Wang, J., Tang, Y., Tang, J., et al. (2024) · Nature Nanotechnology · doi:10.1038/s41565-023-01517-w · Cited by 63
Evolution of patterning materials towards the Moore’s Law 2.0 Era
Goldfarb, D. L. (2022) · Japanese Journal of Applied Physics · doi:10.35848/1347-4065/ac5534 · Cited by 47
Biradar, M. R., Sagdic, G., Yuan, C., Marui, R., & Ober, C. K. (2026) · Chemical Reviews · doi:10.1021/acs.chemrev.5c01043 · Cited by 6
Metadata
- Authors
- Sanders, D. P.
- Venue
- Chemical Reviews
- Publisher
- American Chemical Society (ACS)
- Published
- 2010-01-13
- Volume
- 110
- Issue
- 1
- Pages
- 321-360
- ISSN
- 0009-2665 (ISSN-L)
- 1520-6890
- OpenAlex
- W2025326903
- Cited by
- 290
- References
- 0
- FWCI
- 0.76
- Type
- journal article
- Language
- en
- Open access
- closed
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