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Photocatalytic Degradation of Gaseous Formaldehyde Using TiO2 Film

Noguchi, Tetsuro, Fujishima, Akira, Sawunyama, Phillip, Hashimoto, Kazuhito·1998·Environmental Science & Technology

Abstract

The photocatalytic degradation of gaseous formaldehyde a major cause of sick building syndrome was studied using a TiO 2 thin film. TiO 2 thin films have many unique photoinduced properties, for example, self-cleaning, anti-fouling, and anti-bacterial functions. UV illumination of the TiO 2 thin film placed in a gaseous formaldehyde/air environment resulted in the total mineralization of formaldehyde to CO 2 and H 2 O. We invoked a Langmuir−Hinshelwood kinetic model to analyze the dependence of reaction rates on the concentration of formaldehyde. In addition, the overall decomposition rate constant for formaldehyde was comparable to that of acetaldehyde (a standard test reactant) for initial concentrations of up to 1000 ppmv. However, the apparent adsorption constant K app of formaldehyde onto TiO 2 was ca. 2.5 times larger than that of acetaldehyde. Thus in the low concentration regime, the reactivity of formaldehyde appeared to be greater than that of acetaldehyde. In like manner, a dark adsorption experiment also showed the high adsorption capacity of TiO 2 for formaldehyde. Therefore, we conclude that TiO 2 serves as both a good adsorbent and a photocatalyst for the elimination of gaseous formaldehyde.

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Metadata

Authors
Noguchi, T., Fujishima, A., Sawunyama, P., & Hashimoto, K.
Venue
Environmental Science & Technology
Published
1998-10-28
Volume
32
Issue
23
Pages
3831-3833
ISSN
  • 0013-936X (ISSN-L)
  • 1520-5851
OpenAlex
W2029222791
Cited by
273
References
0
FWCI
3.75
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: Photocatalytic Degradation of Gaseous Formaldehyde Using TiO2 Film. https://app.cochat.ai/papers/10.1021/es980299+
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Noguchi, T., Fujishima, A., Sawunyama, P., & Hashimoto, K. (1998). Photocatalytic Degradation of Gaseous Formaldehyde Using TiO2 Film. Environmental Science & Technology. https://doi.org/10.1021/es980299%2B

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