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Cited by 217

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The Chemical Vapor Deposition of Nickel Phosphide or Selenide Thin Films from a Single Precursor

Panneerselvam, Arunkumar, Malik, Mohammad. A., Afzaal, Mohammad, O'Brien, Paul, Helliwell, Madeleine·2008·Journal of the American Chemical Society

Abstract

Nickel phosphide, nickel selenide thin films and their heterostructure (Ni 0.85 Se/Ni 2 P) were deposited from a newly synthesized single source precursor {Ni[ i Pr 2 P(S)NP(Se) i Pr 2 ] 2 } just by altering the deposition temperature using CVD.

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Metadata

Authors
Panneerselvam, A., Malik, M. A., Afzaal, M., O'Brien, P., & Helliwell, M.
Venue
Journal of the American Chemical Society
Published
2008-02-01
Volume
130
Issue
8
Pages
2420-2421
ISSN
  • 0002-7863 (ISSN-L)
  • 1520-5126
OpenAlex
W1995083814
Cited by
217
References
0
FWCI
7.47
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: The Chemical Vapor Deposition of Nickel Phosphide or Selenide Thin Films from a Single Precursor. https://app.cochat.ai/papers/10.1021/ja078202j
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Panneerselvam, A., Malik, M. A., Afzaal, M., O'Brien, P., & Helliwell, M. (2008). The Chemical Vapor Deposition of Nickel Phosphide or Selenide Thin Films from a Single Precursor. Journal of the American Chemical Society. https://doi.org/10.1021/ja078202j

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Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).

Semantic Scholar’s data is described in: Kinney, R., et al. (2023). The Semantic Scholar Open Data Platform. arXiv:2301.10140.