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Hot-Electron-Induced Dissociation of H2on Gold Nanoparticles Supported on SiO2
Abstract
Hot-electron-induced photodissociation of H2 was demonstrated on small Au nanoparticles (AuNPs) supported on SiO2. The rate of dissociation of H2 was found to be almost 2 orders of magnitude higher than that observed on equivalently prepared AuNPs on TiO2. The rate of H2 dissociation was found to be linearly dependent on illumination intensity with a wavelength dependence resembling the absorption spectrum of the plasmon of the AuNPs. This result provides strong additional support for the hot-electron-induced mechanism for H2 dissociation in this photocatalytic system.
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Cites
Optical Constants of the Noble Metals
Johnson, P. B., & Christy, R. W. (1972) · Physical Review B · doi:10.1103/physrevb.6.4370 · Cited by 20,094
Cited by
Heterometallic antenna−reactor complexes for photocatalysis
Swearer, D. F., Zhao, H., Zhou, L., Zhang, C., Robatjazi, H., Martirez, J. M. P., Krauter, C. M., Yazdi, S., McClain, M. J., Ringe, E., et al. (2016) · Proceedings of the National Academy of Sciences · doi:10.1073/pnas.1609769113 · Cited by 528
Self-citationDistinguishing between plasmon-induced and photoexcited carriers in a device geometry
Zheng, B. Y., Zhao, H., Manjavacas, A., McClain, M., Nordlander, P., & Halas, N. J. (2015) · Nature Communications · doi:10.1038/ncomms8797 · Cited by 382
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Metadata
- Authors
- Mukherjee, S., Zhou, L., Goodman, A. M., Large, N., Ayala-Orozco, C., Zhang, Y., Nordlander, P., & Halas, N. J.
- Venue
- Journal of the American Chemical Society
- Publisher
- American Chemical Society (ACS)
- Published
- 2013-12-26
- Volume
- 136
- Issue
- 1
- Pages
- 64-67
- ISSN
- 0002-7863 (ISSN-L)
- 1520-5126
- OpenAlex
- W2323340661
- Cited by
- 540
- References
- 1
- FWCI
- 11.18
- Type
- journal article
- Language
- en
- Open access
- closed
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- Mukherjee, S., Zhou, L., Goodman, A. M., Large, N., Ayala-Orozco, C., Zhang, Y., Nordlander, P., & Halas, N. J. (2014). Hot-Electron-Induced Dissociation of H2on Gold Nanoparticles Supported on SiO2. Journal of the American Chemical Society. https://doi.org/10.1021/ja411017b
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