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Crystalline Ultrasmooth Self-Assembled Monolayers of Alkylsilanes for Organic Field-Effect Transistors

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Ito, Yutaka, Virkar, Ajay A., Mannsfeld, Stefan, Oh, Joon Hak, Toney, Michael, Locklin, Jason, Bao, Zhenan·2009·Journal of the American Chemical Society

Abstract

Crystalline self-assembled monolayers (SAMs) of organosilane compounds such as octadecyltrimethoxysilane (OTMS) and octadecyltrichlorosilane (OTCS) were deposited by a simple, spin-casting technique onto Si/SiO(2) substrates. Fabrication of the OTMS SAMs and characterization using ellipsometry, contact angle, atomic force microscopy (AFM), grazing angle attenuated total reflectance Fourier transform infrared (GATR-FTIR) spectroscopy and grazing incidence X-ray diffraction (GIXD) are described. The characterization confirms that these monolayers exhibit a well-packed crystalline phase and a remarkably high degree of smoothness. Semiconductors deposited by vapor deposition onto the crystalline OTS SAM grow in a favorable two-dimensional layered growth manner which is generally preferred morphologically for high charge carrier transport. On the OTMS SAM treated dielectric, pentacene OFETs showed hole mobilities as high as 3.0 cm(2)/V x s, while electron mobilities as high as 5.3 cm(2)/V x s were demonstrated for C(60).

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Metadata

Authors
Ito, Y., Virkar, A. A., Mannsfeld, S., Oh, J. H., Toney, M., Locklin, J., & Bao, Z.
Venue
Journal of the American Chemical Society
Published
2009-06-11
Volume
131
Issue
26
Pages
9396-9404
ISSN
  • 0002-7863 (ISSN-L)
  • 1520-5126
OpenAlex
W2082481686
Cited by
598
References
0
FWCI
35.11
Type
journal article
Language
en
Open access
bronze

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CoChat. (2026). Citation check: Crystalline Ultrasmooth Self-Assembled Monolayers of Alkylsilanes for Organic Field-Effect Transistors. https://app.cochat.ai/papers/10.1021/ja9029957
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Ito, Y., Virkar, A. A., Mannsfeld, S., Oh, J. H., Toney, M., Locklin, J., & Bao, Z. (2009). Crystalline Ultrasmooth Self-Assembled Monolayers of Alkylsilanes for Organic Field-Effect Transistors. Journal of the American Chemical Society. https://doi.org/10.1021/ja9029957

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