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Growth of Self-Assembled n-Alkyltrichlorosilane Films on Si(100) Investigated by Atomic Force Microscopy
Abstract
Atomic force microscopy (AFM), contact angle, and ellipsometry measurements are used to investigate the growth behavior of ra-octadecyltrichlorosilane (OTS), ra-propyltrichlorosilane (PTS), and n-triacontyltrichlorosilane (TCTS) films on hydroxylated Si(100) substrates. AFM images show that self-assembled monolayers of OTS (CH3(CH2)i7SiCl3) grow via islands. After an initial nucleation and growth of larger primary OTS islands, smaller secondary islands grow in the areas between the primary islands until the film is complete. The shape and size of the islands and the progress in growth are not well-defined, however, and depend upon the film preparation conditions. In contrast, shorter-chain PTS molecules (CH3(CH2)2SiCls) do not appear to demonstrate this island growth behavior during film formation. Longerchain TCTS molecules (CH3(CH2)29SiCl3) show an island-type of growth with different island structures compared to those observed for OTS. We discuss the differences in growth behavior observed under cleanroom and normal laboratory conditions.
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Cited by
Barbey, R., Lavanant, L., Paripovic, D., Schüwer, N., Sugnaux, C., Tugulu, S., & Klok, H.-A. (2009) · Chemical Reviews · doi:10.1021/cr900045a · Cited by 1,753
Engineering Silicon Oxide Surfaces Using Self‐Assembled Monolayers
Onclin, S., Ravoo, B. J., & Reinhoudt, D. N. (2005) · Angewandte Chemie International Edition · doi:10.1002/anie.200500633 · Cited by 721
Tailoring surface wetting states for ultrafast solar-driven water evaporation
Guo, Y., Zhao, X., Zhao, F., Jiao, Z., Zhou, X., & Yu, G. (2020) · Energy & Environmental Science · doi:10.1039/d0ee00399a · Cited by 432
Metadata
- Authors
- Bierbaum, K., Grunze, M., Baski, A. A., Chi, L. F., Schrepp, W., & Fuchs, H.
- Venue
- Langmuir
- Publisher
- American Chemical Society (ACS)
- Published
- 1995-06
- Volume
- 11
- Issue
- 6
- Pages
- 2143-2150
- ISSN
- 0743-7463 (ISSN-L)
- 1520-5827
- OpenAlex
- W2022514310
- Cited by
- 209
- References
- 0
- FWCI
- 8.62
- Type
- journal article
- Language
- en
- Open access
- closed
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- CoChat. (2026). Citation check: Growth of Self-Assembled n-Alkyltrichlorosilane Films on Si(100) Investigated by Atomic Force Microscopy. https://app.cochat.ai/papers/10.1021/la00006a049
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- Bierbaum, K., Grunze, M., Baski, A. A., Chi, L. F., Schrepp, W., & Fuchs, H. (1995). Growth of Self-Assembled n-Alkyltrichlorosilane Films on Si(100) Investigated by Atomic Force Microscopy. Langmuir. https://doi.org/10.1021/la00006a049
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