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Metallic Contact Formation for Molecular Electronics: Interactions between Vapor-Deposited Metals and Self-Assembled Monolayers of Conjugated Mono- and Dithiols
Open accessAbstract
We present grazing-incidence Fourier transform infrared and AFM data of Au, Al, and Ti vapor-deposited onto self-assembled monolayers (SAMs) of conjugated mono- and dithiols. SAMs of 4,4'''-dimercapto-p-quaterphenyl, 4,4"-dimercapto-p-terphenyl, and 4,4'-dimercapto-p-biphenyl have reactive thiols at the SAM/vacuum interface that interact with vapor-deposited Au or Al atoms, preventing metal penetration. Conjugated monothiols lack such metal blocking groups, and metals (Au, Al) can penetrate into their SAMs. Vapor deposition of Ti onto conjugated mono- and dithiol SAMs and onto hexadecanethiol SAMs destroys the monolayers.
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Cited by
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McCreery, R. L. (2004) · Chemistry of Materials · doi:10.1021/cm049517q · Cited by 555
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Coskun, A., Spruell, J. M., Barin, G., Dichtel, W. R., Flood, A. H., Botros, Y. Y., & Stoddart, J. F. (2012) · Chemical Society Reviews · doi:10.1039/c2cs35053j · Cited by 296
Single-molecule quantum tunnelling sensors
Yi, L., Yang, Y., Zeng, B.-F., Liu, X., Edel, J. B., Ivanov, A. P., & Tang, L. (2026) · Chemical Society Reviews · doi:10.1039/d4cs00375f · Cited by 12
Metadata
- Authors
- de Boer, B., Frank, M. M., Chabal, Y. J., Jiang, W., Garfunkel, E., & Bao, Z.
- Venue
- Langmuir
- Publisher
- American Chemical Society (ACS)
- Published
- 2004-01-27
- Volume
- 20
- Issue
- 5
- Pages
- 1539-1542
- ISSN
- 0743-7463 (ISSN-L)
- 1520-5827
- OpenAlex
- W2024712098
- Cited by
- 194
- References
- 0
- FWCI
- 22.56
- Type
- journal article
- Language
- en
- Open access
- green
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- de Boer, B., Frank, M. M., Chabal, Y. J., Jiang, W., Garfunkel, E., & Bao, Z. (2004). Metallic Contact Formation for Molecular Electronics: Interactions between Vapor-Deposited Metals and Self-Assembled Monolayers of Conjugated Mono- and Dithiols. Langmuir. https://doi.org/10.1021/la0356349
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