The DOI matches its Crossref record; 1 of the 1 references it cites were found in a registry or an index.
Using Surface Active Random Copolymers To Control the Domain Orientation in Diblock Copolymer Thin Films
Abstract
The structure of thin films of a symmetric diblock copolymer, P(dS- b -MMA) (dS = perdeuterated styrene, MMA = methyl methacrylate), was investigated near preferential and nonpreferential (neutral) surfaces. Neutral surfaces were achieved at the substrate and air interfaces by localizing random copolymer, P(S- r -MMA), having a styrene fraction of 0.60, to each of these interfaces. This was performed by chemically grafting the random copolymer to the substrate and anchoring a surface active random copolymer having a perfluorinated end group to the air interface, respectively. Neutron reflectivity and small-angle neutron scattering were used to determine the orientation of the lamellar microdomains for films having various boundary conditions. Successive steps of CF 4 reactive ion etching followed by field emission scanning electron microscopy were used to ascertain the orientation of the microdomains as a function of film depth. For films confined between two continuous neutral surfaces, the orientation of the lamellar microdomains is observed to be perpendicular to the film surfaces throughout the entire film thickness.
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Citations
Cites
Interfacial segregation in disordered block copolymers: Effect of tunable surface potentials
Mansky, P., Russell, T. P., Hawker, C. J., Mays, J., Cook, D. C., & Satija, S. K. (1997) · Physical Review Letters · doi:10.1103/physrevlett.79.237 · Cited by 255
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Cited by
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Kusoglu, A., & Weber, A. Z. (2017) · Chemical Reviews · doi:10.1021/acs.chemrev.6b00159 · Cited by 2,432
Nitroxide-mediated polymerization
Nicolas, J., Guillaneuf, Y., Lefay, C., Bertin, D., Gigmes, D., & Charleux, B. (2013) · Progress in Polymer Science · doi:10.1016/j.progpolymsci.2012.06.002 · Cited by 1,380
Directing the self-assembly of block copolymers
Darling, S. B. (2007) · Progress in Polymer Science · doi:10.1016/j.progpolymsci.2007.05.004 · Cited by 1,019
Block copolymer based nanostructures: Materials, processes, and applications to electronics
Kim, H.-C., Park, S.-M., & Hinsberg, W. D. (2010) · Chemical Reviews · doi:10.1021/cr900159v · Cited by 1,017
Nanostructure fabrication using block copolymers
Hamley, I. W. (2003) · Nanotechnology · doi:10.1088/0957-4484/14/10/201 · Cited by 773
Metadata
- Authors
- Huang, E., Russell, T. P., Harrison, C., Chaikin, P. M., Register, R. A., Hawker, C. J., & Mays, J.
- Venue
- Macromolecules
- Publisher
- American Chemical Society (ACS)
- Published
- 1998-10-10
- Volume
- 31
- Issue
- 22
- Pages
- 7641-7650
- ISSN
- 0024-9297 (ISSN-L)
- 1520-5835
- OpenAlex
- W2067383284
- Cited by
- 293
- References
- 1
- FWCI
- 8.48
- Type
- journal article
- Language
- en
- Open access
- closed
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