Student or educator? Sign up with your school email and get 6 months of Pro free.
Cited by 524

The DOI matches its Crossref record.

Plasmonic Nanolithography

Srituravanich, Werayut, Fang, Nicholas, Sun, Cheng, Luo, Qi, Zhang, Xiang·2004·Nano Letters

Abstract

In this paper, we demonstrate high-density nanolithography by utilizing surface plasmons (SPs). SPs are excited on an aluminum substrate perforated with 2-D hole arrays using a near UV light source in order to resolve sub-wavelength features with high transmission. Our lithography experiments using a 365 nm wavelength light source demonstrate 90 nm dot array patterns on a 170 nm period, well beyond the diffraction limit of far-field optical lithography. In far-field transmission measurements, strong UV light transmission and the wavelength-dependent transmission are observed, which confirms the contribution of SPs. Furthermore, an exposure with larger spacing between the mask and photoresist has been explored for potential noncontact lithography.

Overview

The claims and statistics of this paper haven’t been checked yet.

Run the check — free, no account needed. It reads the open-access text and checks the sources it cites.

A few free checks a day · papers already verified open instantly · results are public

Integrity signals

Registry

Crossref · 10.1021/nl049573q

Cites

Statistics

Verification

Claims the paper makes

The claims and statistics of this paper haven’t been checked yet.

Run the check — free, no account needed. It reads the open-access text and checks the sources it cites.

A few free checks a day · papers already verified open instantly · results are public

Self-check

Percentages, sums and reported differences re-computed from the paper’s own numbers.

The self-check needs the paper’s full text.

Citations

Cited by

See all 524

Metadata

Authors
Srituravanich, W., Fang, N., Sun, C., Luo, Q., & Zhang, X.
Venue
Nano Letters
Published
2004-05-19
Volume
4
Issue
6
Pages
1085-1088
ISSN
  • 1530-6984 (ISSN-L)
  • 1530-6992
OpenAlex
W4256681254
Cited by
524
References
0
FWCI
15.64
Type
journal article
Language
en
Open access
closed

About these checks

Registry, retraction, Cites and statistics results are computed, not judged, with one exception: a printed reference that no index lists is read once by a model before it counts as a citation error. Claims are extracted by a model and kept only when their quote appears verbatim in the text; each cited source is then checked, with a model’s help, for whether it says what the claim relies on. Those verdicts can be wrong — read the claim’s quote and the cited source before relying on one.

Statistics and arithmetic are recomputed, not judged.

Confidence bands are shown only for fields calibrated on our annotated test set. None is calibrated yet, so no band is shown.

What counts as a claim ›How we measure confidence ›How we check this ›

Are you an author, or do you see a problem with this page? Request a review

How to cite

Cite CoChat for the checks on this page, and the paper for its own findings.

This page
CoChat. (2026). Citation check: Plasmonic Nanolithography. https://app.cochat.ai/papers/10.1021/nl049573q
The paper
Srituravanich, W., Fang, N., Sun, C., Luo, Q., & Zhang, X. (2004). Plasmonic Nanolithography. Nano Letters. https://doi.org/10.1021/nl049573q

Data sources

Bibliographic data: Semantic Scholar, OpenAlex, Crossref.

Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).

Semantic Scholar’s data is described in: Kinney, R., et al. (2023). The Semantic Scholar Open Data Platform. arXiv:2301.10140.