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Circuit Fabrication at 17 nm Half-Pitch by Nanoimprint Lithography
Abstract
High density metal cross bars at 17 nm half-pitch were fabricated by nanoimprint lithography. Utilizing the superlattice nanowire pattern transfer technique, a 300-layer GaAs/AlGaAs superlattice was employed to produce an array of 150 Si nanowires (15 nm wide at 34 nm pitch) as an imprinting mold. A successful reproduction of the Si nanowire pattern was demonstrated. Furthermore, a cross-bar platinum nanowire array with a cell density of approximately 100 Gbit/cm(2) was fabricated by two consecutive imprinting processes.
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Cited by
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Memristive switching mechanism for metal/oxide/metal nanodevices
Yang, J. J., Pickett, M. D., Li, X., Ohlberg, D. A. A., Stewart, D. R., & Williams, R. S. (2008) · Nature Nanotechnology · doi:10.1038/nnano.2008.160 · Cited by 2,987
Self-citation‘Memristive’ switches enable ‘stateful’ logic operations via material implication
Borghetti, J., Snider, G. S., Kuekes, P. J., Yang, J. J., Stewart, D. R., & Williams, R. S. (2010) · Nature · doi:10.1038/nature08940 · Cited by 1,929
Self-citationShort-Term Memory to Long-Term Memory Transition in a Nanoscale Memristor
Chang, T., Jo, S.-H., & Lu, W. (2011) · ACS Nano · doi:10.1021/nn202983n · Cited by 1,058
Highly ordered nanowire arrays on plastic substrates for ultrasensitive flexible chemical sensors
McAlpine, M. C., Ahmad, H., Wang, D., & Heath, J. R. (2007) · Nature Materials · doi:10.1038/nmat1891 · Cited by 959
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Metadata
- Authors
- Jung, G.-Y., Johnston-Halperin, E., Wu, W., Yu, Z., Wang, S.-Y., Tong, W. M., Li, Z., Green, J. E., Sheriff, B. A., Boukai, A., Bunimovich, Y., Heath, J. R., & Williams, R. S.
- Venue
- Nano Letters
- Publisher
- American Chemical Society (ACS)
- Published
- 2006-02-04
- Volume
- 6
- Issue
- 3
- Pages
- 351-354
- ISSN
- 1530-6984 (ISSN-L)
- 1530-6992
- OpenAlex
- W2014286544
- Cited by
- 172
- References
- 0
- FWCI
- 19.01
- Type
- journal article
- Language
- en
- Open access
- closed
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- Jung, G.-Y., Johnston-Halperin, E., Wu, W., Yu, Z., Wang, S.-Y., Tong, W. M., Li, Z., Green, J. E., Sheriff, B. A., Boukai, A., Bunimovich, Y., Heath, J. R., & Williams, R. S. (2006). Circuit Fabrication at 17 nm Half-Pitch by Nanoimprint Lithography. Nano Letters. https://doi.org/10.1021/nl052110f
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