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Orientation-Controlled Self-Assembled Nanolithography Using a Polystyrene−Polydimethylsiloxane Block Copolymer
Abstract
Templated self-assembly of a cylinder-forming poly(styrene-b-dimethylsiloxane) (PS-PDMS) diblock copolymer has been investigated for nanolithography applications. The large chi-parameter of the blocks and the use of a PDMS-brush substrate surface treatment are especially advantageous for achieving long-range ordering and minimizing defect densities, and the high Si content in PDMS leaves a robust oxide etch mask after two-step reactive ion etching. By adjusting mesa width and solvent-annealing vapor pressure and time, the cylinders can be intentionally oriented parallel or perpendicular to the trench walls. Pattern transfer into thin silica is also demonstrated. This block copolymer system has excellent characteristics for self-assembled nanolithography applications.
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Cited by
Oligosaccharide/silicon-containing block copolymers with 5 nm features for lithographic applications
Cushen, J. D., Otsuka, I., Bates, C. M., Halila, S., Fort, S., Rochas, C., Easley, J. A., Rausch, E. L., Thio, A., Borsali, R., et al. (2012) · ACS Nano · doi:10.1021/nn300459r · Cited by 211
Cyclic block copolymers for controlling feature sizes in block copolymer lithography
Poelma, J. E., Ono, K., Miyajima, D., Aida, T., Satoh, K., & Hawker, C. J. (2012) · ACS Nano · doi:10.1021/nn304217y · Cited by 189
Rodwogin, M. D., Spanjers, C. S., Leighton, C., & Hillmyer, M. A. (2010) · ACS Nano · doi:10.1021/nn901190a · Cited by 140
Keen, I., Yu, A., Cheng, H.-H., Jack, K. S., Nicholson, T. M., Whittaker, A. K., & Blakey, I. (2012) · Langmuir · doi:10.1021/la304141m · Cited by 56
Metadata
- Authors
- Jung, Y. S., & Ross, C. A.
- Venue
- Nano Letters
- Publisher
- American Chemical Society (ACS)
- Published
- 2007-06-15
- Volume
- 7
- Issue
- 7
- Pages
- 2046-2050
- ISSN
- 1530-6984 (ISSN-L)
- 1530-6992
- OpenAlex
- W1998009021
- Cited by
- 449
- References
- 0
- FWCI
- 10.97
- Type
- journal article
- Language
- en
- Open access
- closed
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- Jung, Y. S., & Ross, C. A. (2007). Orientation-Controlled Self-Assembled Nanolithography Using a Polystyrene−Polydimethylsiloxane Block Copolymer. Nano Letters. https://doi.org/10.1021/nl070924l
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