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Cited by 867

The DOI matches its Crossref record; 4 of the 4 references it cites were found in a registry or an index.

Graphene Oxidation: Thickness-Dependent Etching and Strong Chemical Doping

Open access
Liu, Li, Ryu, Sunmin, Tomasik, Michelle R., Stolyarova, Elena, Jung, Naeyoung, Hybertsen, Mark S., Steigerwald, Michael L., Brus, Louis E., Flynn, George W.·2008·Nano Letters

Abstract

Patterned graphene shows substantial potential for applications in future molecular-scale integrated electronics. Environmental effects are a critical issue in a single-layer material where every atom is on the surface. Especially intriguing is the variety of rich chemical interactions shown by molecular oxygen with aromatic molecules. We find that O 2 etching kinetics vary strongly with the number of graphene layers in the sample. Three-layer-thick samples show etching similar to bulk natural graphite. Single-layer graphene reacts faster and shows random etch pits in contrast to natural graphite where nucleation occurs at point defects. In addition, basal plane oxygen species strongly hole dope graphene, with a Fermi level shift of approximately 0.5 eV. These oxygen species desorb partially in an Ar gas flow, or under irradiation by far UV light, and readsorb again in an O 2 atmosphere at room temperature. This strongly doped graphene is very different from "graphene oxide" made by mineral acid attack.

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Metadata

Authors
Liu, L., Ryu, S., Tomasik, M. R., Stolyarova, E., Jung, N., Hybertsen, M. S., Steigerwald, M. L., Brus, L. E., & Flynn, G. W.
Venue
Nano Letters
Published
2008-06-19
Volume
8
Issue
7
Pages
1965-1970
ISSN
  • 1530-6984 (ISSN-L)
  • 1530-6992
OpenAlex
W2125819763
Cited by
867
References
4
FWCI
22.06
Type
journal article
Language
en
Open access
green

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CoChat. (2026). Citation check: Graphene Oxidation: Thickness-Dependent Etching and Strong Chemical Doping. https://app.cochat.ai/papers/10.1021/nl0808684
The paper
Liu, L., Ryu, S., Tomasik, M. R., Stolyarova, E., Jung, N., Hybertsen, M. S., Steigerwald, M. L., Brus, L. E., & Flynn, G. W. (2008). Graphene Oxidation: Thickness-Dependent Etching and Strong Chemical Doping. Nano Letters. https://doi.org/10.1021/nl0808684

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