Plasmonic Color Filters for CMOS Image Sensor Applications
Abstract
We report on the optical properties of plasmonic hole arrays as they apply to requirements for plasmonic color filters designed for state-of-the-art Si CMOS image sensors. The hole arrays are composed of hexagonally packed subwavelength sized holes on a 150 nm Al film designed to operate at the primary colors of red, green, and blue. Hole array plasmonic filters show peak transmission in the 40-50% range for large (>5 × 5 μm(2)) size filters and maintain their filtering function for pixel sizes as small as ∼1 × 1 μm(2), albeit at a cost in transmission efficiency. Hole array filters are found to robust with respect to spatial crosstalk between pixel within our detection limit and preserve their filtering function in arrays containing random defects. Analysis of hole array filter transmittance and crosstalk suggests that nearest neighbor hole-hole interactions rather than long-range interactions play the dominant role in the transmission properties of plasmonic hole array filters. We verify this via a simple nearest neighbor model that correctly predicts the hole array transmission efficiency as a function of the number of holes.
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Initial investigations into metasurface spectral filters used plasmonic metals, but there has been a gradual shift towards all-dielectric metasurfaces owing to their comparatively lesser optical absorption.
“Initial investigations into metasurface spectral filters used plasmonic metals [8–13], but there has been a gradual shift towards all-dielectric metasurfaces (ADM) [14–17] owing to their comparatively lesser optical absorption.”
From Robust inverse design of all-dielectric metasurface transmission-mode color filters (2020) · cites this paper as [12]
The color gamut of the filters designed in this work is not as good as the gamut of a plasmonic color filter array.
“However, the color gamut observed are not as good as the gamut of a plasmonic color filter arrays which could indicate the ultimate limitations imposed by the dielectric permittivity of silicon.”
From Robust inverse design of all-dielectric metasurface transmission-mode color filters (2020) · cites this paper as [12]
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Recent Advances in Perovskite Photodetectors for Image Sensing
Li, L., Ye, S., Qu, J., Zhou, F., Song, J., & Shen, G. (2021) · Small · doi:10.1002/smll.202005606 · Cited by 235 · see citing works
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Song, M., Wang, D., Peana, S., Choudhury, S., Nyga, P., Kudyshev, Z. A., Yu, H., Boltasseva, A., Shalaev, V. M., & Kildishev, A. V. (2019) · Applied Physics Reviews · doi:10.1063/1.5110051 · Cited by 212 · see citing works
Robust inverse design of all-dielectric metasurface transmission-mode color filters
Panda, S. S., Vyas, H. S., & Hegde, R. S. (2020) · Optical Materials Express · doi:10.1364/ome.409186 · Cited by 33 · see citing works
- Authors
- Yokogawa, S., Burgos, S. P., & Atwater, H. A.
- Affiliations
- California Institute of Technology (US)
- Corresponding author
- Atwater, Harry A.
- ORCID
- Atwater, Harry A.
- Venue
- Nano Letters
- Publisher
- American Chemical Society (ACS)
- Published
- 2012-07-17
- Volume
- 12
- Issue
- 8
- Pages
- 4349-4354
- ISSN
- 1530-6984 (ISSN-L)
- 1530-6992
- OpenAlex
- W1969131959
- Cited by
- 614
- References
- 0
- Citations by year
- 2026: 14 · 2025: 15 · 2024: 32 · 2023: 28 · 2022: 36 · 2021: 62 · 2020: 66 · 2019: 66 · 2018: 69 · 2017: 49 · 2016: 61 · 2015: 52 · 2014: 41 · 2013: 19 · 2012: 4
- FWCI
- 21.13
- Type
- journal article
- Language
- en
- Open access
- closed
- Locations
- Nano Letters (publishedVersion)
- PubMed (publishedVersion)
- CaltechAUTHORS (California Institute of Technology) (submittedVersion)
- Topics
- Physical Sciences › Engineering › Biomedical Engineering › Plasmonic and Surface Plasmon Research
- Physical Sciences › Materials Science › Electronic, Optical and Magnetic Materials › Gold and Silver Nanoparticles Synthesis and Applications
- Physical Sciences › Materials Science › Electronic, Optical and Magnetic Materials › Metamaterials and Metasurfaces Applications
- Keywords
- plasmonic color filters, CMOS image sensor, subwavelength holes, aluminum thin films, pixel crosstalk, nearest-neighbor interactions, transmission efficiency, random defects, nearest-neighbor model
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