The DOI matches its Crossref record; 1 of the 1 references it cites were found in a registry or an index.
Fast Assembly of Ordered Block Copolymer Nanostructures through Microwave Annealing
Abstract
Block copolymer self-assembly is an innovative technology capable of patterning technologically relevant substrates with nanoscale precision for a range of applications from integrated circuit fabrication to tissue interfacing, for example. In this article, we demonstrate a microwave-based method of rapidly inducing order in block copolymer structures. The technique involves the usage of a commercial microwave reactor to anneal block copolymer films in the presence of appropriate solvents, and we explore the effect of various parameters over the polymer assembly speed and defect density. The approach is applied to the commonly used poly(styrene)-b-poly(methyl methacrylate) (PS-b-PMMA) and poly(styrene)-b-poly(2-vinylpyridine) (PS-b-P2VP) families of block copolymers, and it is found that the substrate resistivity, solvent environment, and anneal temperature all critically influence the self-assembly process. For selected systems, highly ordered patterns were achieved in less than 3 min. In addition, we establish the compatibility of the technique with directed assembly by graphoepitaxy.
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Citations
Cites
Macroscopic 10-terabit–per–square-inch arrays from block copolymers with lateral order
Park, S., Lee, D. H., Xu, J., Kim, B., Hong, S. W., Jeong, U., Xu, T., & Russell, T. P. (2009) · Science · doi:10.1126/science.1168108 · Cited by 740
Cited by
Solvent Vapor Annealing of Block Polymer Thin Films
Sinturel, C., Vayer, M., Morris, M., & Hillmyer, M. A. (2013) · Macromolecules · doi:10.1021/ma400735a · Cited by 543
Metadata
- Authors
- Zhang, X., Harris, K. D., Wu, N. L. Y., Murphy, J. N., & Buriak, J. M.
- Venue
- ACS Nano
- Publisher
- American Chemical Society (ACS)
- Published
- 2010-10-21
- Volume
- 4
- Issue
- 11
- Pages
- 7021-7029
- ISSN
- 1936-0851 (ISSN-L)
- 1936-086X
- OpenAlex
- W2315362640
- Cited by
- 158
- References
- 1
- FWCI
- 3.71
- Type
- journal article
- Language
- en
- Open access
- closed
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Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).
Semantic Scholar’s data is described in: Kinney, R., et al. (2023). The Semantic Scholar Open Data Platform. arXiv:2301.10140.
