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Cited by 637

The DOI matches its Crossref record; 2 of the 2 references it cites were found in a registry or an index.

Electrochemical Delamination of CVD-Grown Graphene Film: Toward the Recyclable Use of Copper Catalyst

Wang, Yu, Zheng, Yi, Xu, Xiangfan, Dubuisson, Emilie, Bao, Qiaoliang, Lu, Jiong, Loh, Kian Ping·2011·ACS Nano

Abstract

The separation of chemical vapor deposited (CVD) graphene from the metallic catalyst it is grown on, followed by a subsequent transfer to a dielectric substrate, is currently the adopted method for device fabrication. Most transfer techniques use a chemical etching method to dissolve the metal catalysts, thus imposing high material cost in large-scale fabrication. Here, we demonstrate a highly efficient, nondestructive electrochemical route for the delamination of CVD graphene film from metal surfaces. The electrochemically delaminated graphene films are continuous over 95% of the surface and exhibit increasingly better electronic quality after several growth cycles on the reused copper catalyst, due to the suppression of quasi-periodical nanoripples induced by copper step edges. The electrochemical delamination process affords the advantages of high efficiency, low-cost recyclability, and minimal use of etching chemicals.

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Crossref · 10.1021/nn203700w

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Metadata

Authors
Wang, Y., Zheng, Y., Xu, X., Dubuisson, E., Bao, Q., Lu, J., & Loh, K. P.
Venue
ACS Nano
Published
2011-11-04
Volume
5
Issue
12
Pages
9927-9933
ISSN
  • 1936-0851 (ISSN-L)
  • 1936-086X
OpenAlex
W2327841969
Cited by
637
References
2
FWCI
12.55
Type
journal article
Language
en
Open access
closed

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