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Morphology Control in Block Copolymer Films Using Mixed Solvent Vapors
Abstract
Solvent vapor annealing of block copolymer thin films can produce a range of morphologies different from the equilibrium bulk morphology. By systematically varying the flow rate of two different solvent vapors (toluene and n-heptane) and an inert gas, phase maps showing the morphology versus vapor pressure of the solvents were constructed for 45 kg/mol polystyrene-block-polydimethylsiloxane diblock copolymer films of different thicknesses. The final morphology was correlated with the swelling of the block copolymer and homopolymer films and the solvent vapor annealing conditions. Self-consistent field theory is used to model the effects of solvent swelling. These results provide a framework for predicting the range of morphologies available under different solvent vapor conditions, which is important in lithographic applications where precise control of morphology and critical dimensions are essential.
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Cites
Macroscopic 10-terabit–per–square-inch arrays from block copolymers with lateral order
Park, S., Lee, D. H., Xu, J., Kim, B., Hong, S. W., Jeong, U., Xu, T., & Russell, T. P. (2009) · Science · doi:10.1126/science.1168108 · Cited by 740
Cited by
Solvent Vapor Annealing of Block Polymer Thin Films
Sinturel, C., Vayer, M., Morris, M., & Hillmyer, M. A. (2013) · Macromolecules · doi:10.1021/ma400735a · Cited by 543
Metadata
- Authors
- Gotrik, K. W., Hannon, A. F., Son, J. G., Keller, B., Alexander-Katz, A., & Ross, C. A.
- Venue
- ACS Nano
- Publisher
- American Chemical Society (ACS)
- Published
- 2012-08-31
- Volume
- 6
- Issue
- 9
- Pages
- 8052-8059
- ISSN
- 1936-0851 (ISSN-L)
- 1936-086X
- OpenAlex
- W1965155859
- Cited by
- 221
- References
- 1
- FWCI
- 9.85
- Type
- journal article
- Language
- en
- Open access
- closed
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Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).
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