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Cited by 1,422

The DOI matches its Crossref record; 3 of the 3 references it cites were found in a registry or an index.

Few-Layer MoS2: A Promising Layered Semiconductor

Ganatra, Rudren, Zhang, Qing·2014·ACS Nano

Abstract

Due to the recent expanding interest in two-dimensional layered materials, molybdenum disulfide (MoS2) has been receiving much research attention. Having an ultrathin layered structure and an appreciable direct band gap of 1.9 eV in the monolayer regime, few-layer MoS2 has good potential applications in nanoelectronics, optoelectronics, and flexible devices. In addition, the capability of controlling spin and valley degrees of freedom makes it a promising material for spintronic and valleytronic devices. In this review, we attempt to provide an overview of the research relevant to the structural and physical properties, fabrication methods, and electronic devices of few-layer MoS2. Recent developments and advances in studying the material are highlighted.

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Metadata

Authors
Ganatra, R., & Zhang, Q.
Venue
ACS Nano
Published
2014-04-14
Volume
8
Issue
5
Pages
4074-4099
ISSN
  • 1936-0851 (ISSN-L)
  • 1936-086X
OpenAlex
W2331708333
Cited by
1,422
References
3
FWCI
62.24
Type
journal article
Language
en
Open access
closed

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