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Cited by 185

The DOI matches its Crossref record.

Electrochemical deposition of Copper on patterned Cu/Ta(N)/SiO2 surfaces for super filling of sub-micron features

Li, W.H., Ye, J.H., Li, S.F.Y.·2001·Journal of Applied Electrochemistry

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Metadata

Authors
Li, W. H., Ye, J. H., & Li, S. F. Y.
Venue
Journal of Applied Electrochemistry
Published
2001-12
Volume
31
Issue
12
Pages
1395-1397
ISSN
  • 0021-891X (ISSN-L)
  • 1572-8838
OpenAlex
W2003269425
Cited by
185
References
0
FWCI
2.67
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: Electrochemical deposition of Copper on patterned Cu/Ta(N)/SiO2 surfaces for super filling of sub-micron features. https://app.cochat.ai/papers/10.1023/a:1013872107905
The paper
Li, W. H., Ye, J. H., & Li, S. F. Y. (2001). Electrochemical deposition of Copper on patterned Cu/Ta(N)/SiO2 surfaces for super filling of sub-micron features. Journal of Applied Electrochemistry. https://doi.org/10.1023/a%3A1013872107905

Data sources

Bibliographic data: Semantic Scholar, OpenAlex, Crossref.

Contains information from the Semantic Scholar Academic Graph Datasets, made available under the ODC Attribution License (ODC-BY 1.0).

Semantic Scholar’s data is described in: Kinney, R., et al. (2023). The Semantic Scholar Open Data Platform. arXiv:2301.10140.