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A chemical mechanism for use in long‐range transport/acid deposition computer modeling

Lurmann, Frederick W., Lloyd, Alan C., Atkinson, Roger·1986·Journal of Geophysical Research: Atmospheres

Abstract

A chemical mechanism for the gas phase atmospheric oxidation of nitrogen oxides (NOx) and sulfur dioxide (SO 2) in the presence of reactive hydrocarbons (RHC) has been developed for use in long‐range transport modeling. The mechanism includes numerous reactions important for nighttime and multiday simulations which have been previously ignored in photochemical mechanisms designed for urban scale applications. This mechanism is capable of simulating the decay of NOx/SO 2/RHC precursors and the formation of oxidation products such as nitric acid, sulfuric acid, ozone, hydrogen peroxide, hydroperoxides, and organic peroxides which have recognized roles in the acidification of precipitation. Testing of detailed and condensed versions of the chemical mechanism is reported.

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Metadata

Authors
Lurmann, F. W., Lloyd, A. C., & Atkinson, R.
Venue
Journal of Geophysical Research: Atmospheres
Published
1986-09-20
Volume
91
Issue
D10
Pages
10905-10936
ISSN
0148-0227 (ISSN-L)
OpenAlex
W2095059645
Cited by
346
References
0
FWCI
9.08
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: A chemical mechanism for use in long‐range transport/acid deposition computer modeling. https://app.cochat.ai/papers/10.1029/jd091id10p10905
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Lurmann, F. W., Lloyd, A. C., & Atkinson, R. (1986). A chemical mechanism for use in long‐range transport/acid deposition computer modeling. Journal of Geophysical Research: Atmospheres. https://doi.org/10.1029/jd091id10p10905

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