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Single-crystal silicon: a new material for 1.3 and 1.6 μm integrated-optical components
Abstract
The first all-silicon integrated-optical components for 1.3/1.6 μm have been demonstrated. An optical power divider with end-fire coupling was constructed from intersecting channel waveguides. Guides were fabricated by plasma-etching of an intrinsic Si layer grown epitaxially on a heavily doped Si substrate (n on n+ or p on p+). Active components are proposed.
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Silicon-based photonic integrated circuits (PICs) were introduced in 1985.
“Silicon-based photonic integrated circuits (PICs) were introduced in 19853”
From Roadmapping the next generation of silicon photonics (2024) · cites this paper as [3]
Citations
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References 3 · Cited by 140
Research works printed but not linked: 3
- Fan, 1954, Photo conductivity conference, 184
- Swimm, 1985, Proceedings of conference of basic properties of optical materials, 158
- Mikami, 1984, 20, 228
Metadata
- Authors
- Soref, R. A., & Lorenzo, J. P.
- Affiliations
- Hanscom Air Force Base (US)
- ORCID
- Soref, R.A.
- Venue
- Electronics Letters
- Published
- 1985-10-10
- Volume
- 21
- Issue
- 21
- Pages
- 953-954
- ISSN
- 0013-5194 (ISSN-L)
- 1350-911X
- OpenAlex
- W2018672401
- Cited by
- 140
- References
- 3
- Citations by year
- 2026: 3 · 2025: 5 · 2024: 9 · 2023: 7 · 2022: 4 · 2021: 8 · 2020: 8 · 2019: 6 · 2018: 12 · 2017: 6 · 2016: 9 · 2015: 4 · 2014: 1 · 2013: 7 · 2012: 6
- FWCI
- 2.70
- Type
- journal article
- Language
- en
- Open access
- closed
- Locations
- Electronics Letters (publishedVersion)
- Topics
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Photonic and Optical Devices
- Physical Sciences › Physics and Astronomy › Atomic and Molecular Physics, and Optics › Photorefractive and Nonlinear Optics
- Physical Sciences › Engineering › Electrical and Electronic Engineering › Semiconductor Lasers and Optical Devices
- Keywords
- monocrystalline silicon, integrated photonics, 1.3 μm wavelength, optical splitter, end-fire coupling, channel waveguides, plasma etching, epitaxial silicon, silicon photonics
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