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ZnO-based transparent thin-film transistors

Hoffman, R. L., Norris, B. J., Wager, J. F.·2003·Applied Physics Letters

Abstract

Highly transparent ZnO-based thin-film transistors (TFTs) are fabricated with optical transmission (including substrate) of ∼75% in the visible portion of the electromagnetic spectrum. Current–voltage measurements indicate n-channel, enhancement-mode TFT operation with excellent drain current saturation and a drain current on-to-off ratio of ∼107. Threshold voltages and channel mobilities of devices fabricated to date range from ∼10 to 20 V and ∼0.3 to 2.5 cm2/V s, respectively. Exposure to ambient light has little to no observable effect on the drain current. In contrast, exposure to intense ultraviolet radiation results in persistent photoconductivity, associated with the creation of electron-hole pairs by ultraviolet photons with energies greater than the ZnO band gap. Light sensitivity is reduced by decreasing the ZnO channel layer thickness. One attractive application for transparent TFTs involves their use as select-transistors in each pixel of an active-matrix liquid-crystal display.

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Metadata

Authors
Hoffman, R. L., Norris, B. J., & Wager, J. F.
Venue
Applied Physics Letters
Published
2003-02-03
Volume
82
Issue
5
Pages
733-735
ISSN
  • 0003-6951 (ISSN-L)
  • 1077-3118
OpenAlex
W2134960271
Cited by
1,397
References
0
FWCI
47.60
Type
journal article
Language
en
Open access
closed

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CoChat. (2026). Citation check: ZnO-based transparent thin-film transistors. https://app.cochat.ai/papers/10.1063/1.1542677
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Hoffman, R. L., Norris, B. J., & Wager, J. F. (2003). ZnO-based transparent thin-film transistors. Applied Physics Letters. https://doi.org/10.1063/1.1542677

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